MicroDevice Laboratory
The multi-user MicroDevice Laboratory (MDL) is housed within an 800 square feet cleanroom at Stevens Institute of Technology.
Mission
The MicroDevice Laboratory (MDL) is an Institute multiuser facility whose mission is to provide cutting edge nanofabrication and characterization facilities to support the research and educational programs of then Institute. It furthermore provides hands-on research opportunities for undergraduate and graduate students.
Lab Director
Lab Staff
Dr. Kyungnam Kang (2013-current)
Postdoctoral Scholar
Ph.D. from Louisiana State University
Research: 2D materials
MicroDevice Lab Capabilities
Lithography
Mask aligner, Spin coater, Nanoimprintor, Bake ovens, Wet bench, Microscope
Device Testing
Probe station, SEM, Microscope
Etch & Deposition
DRIE, ICP, XeF2 etcher, Wet etch bench, PVD, Thermal evaporator, MVD
Facility Overview
The multi-user MicroDevice Laboratory (MDL) is housed within an 800 square feet clean room at Stevens Institute of Technology.
People
Name | Research Topic |
|---|---|
Abdus Salam Sarkar | 2D materials |
Chao Sui | Tissue/organ-on-chip and immunotherapy |
Elham Easy | Study of microstructure of additive manufacturing devices |
Greg Hader | Nano-sheet resonators |
Hearsh Hoshing | |
Hibal Ahmad | Thermal conductivity |
Javid Akhavan Taheri Boroujeni | 3D printing |
Jeric Hernandez | 2D material for thermoelectric measurement |
Jongyoun Son | ME Lab manager |
Ke Xu | |
Licheng Xiao | |
Kyungnam Kang | MDL manager |
Mengqi Fang | 2D material growth |
Na Liu | 2D material optical property measurement |
Seyed S Mohajerani | |
Seyed Mohammad Hosseini | 3D printing |
Shuai Yu | pHEMA hydrogel fabrication |
Siwei Chen | MTJ fabrication |
Yazhou Zhou | |
Yingtao Wang | Graphene device |
Youmna Mahmoud | 3D printing |
Yunong Tang | 2D materials fabrication |
Zheqi Li | Carbon nanotubes |
Zitao Tang | Graphene ring |
User Fees
Equipment | Hourly fee $ for Stevens Users (1 hour minimum) | Hourly fee $ for External Users | Note |
|---|---|---|---|
Mask aligner (MA6) | 50 | 100 | |
PVD | 50 (excluding pumping time) | 100 (excluding pumping time) | user brings crucibles/targets |
DRIE | 100 | 200 | |
ICP etcher | 100 | 200 | |
XeF2 etcher | 50 | 100 | |
Nanoimprintor | 50 | 100 | user brings mold photoresists |
Probe station | 50 | 100 | |
O2 Plasma | 50 | 100 | |
Spin coater, oven, hot plates, hood | 50 (exempted if using with MA6 or etchers) | 100 (exempted if using with MA6 or etchers) | user brings photoresists/developers |
SEM | 50 | 100 | |
AFM | 50 | 100 | user brings AFM tips |
Equipment training | 200 | 300 | |
Equipment operated by staff | 100 + equipment hourly fee | 100 + equipment hourly fee |