Burchard Lab (513) and Carnegie Lab
Our laboratory is equipped with extensive equipment for the preparation and characterization of nanostructures of 1D and 2D layers, including:
Fabrication/Preparation
Graphene Square TCVD50B
Atmospheric Pressure Chemical Vapor Deposition (APCVD) System: (Lindberg/Blue STF55346C)
4 Low Pressure Chemical Vapor Deposition (LPCVD) Systems: (MTI OTF-1200X)
Home-built XYZ Theta Transfer Stage
Critical Point Dryer (Tousimis Samdri 780A)
Ultrasonic bath (Digital Pro)
Centrifuge 5418 (Eppendorf)
Characterization
AFM System (Nanonics MV1000 and MV2000)
Raman Spectrometer (Horiba XPLORA)
Digital Microscope (Hirox KH300LCD)
Goniometer/Tensiometer (Ramé-Hart Model 250)
Cryostat ST-500 (Lakeshore Cryptonics)
Home-built Probe station with laser excitation source 405 nm, 532 nm and 650 nm (KeyFactor System and Lights88)
Optical Microscope (AmScope)
Electrical Measurements
Galvanostat/Potentiostat (Princeton Applied Research 263A-1)
Spectrum Analyzer (Advantest R3131A)
Signal Waveform Generator (Agilent 33250A)
Digital Oscilloscope (GW-INSTEK GOS-620)
Source Meter (Keithley 6487 instrument)
Microfabrication Facility
The multi-user Micro Device Laboratory is housed within an 800-square-foot clean room at Stevens. For further information concerning equipment within the facility, please visit Facility Overview on the MDL website.
Imaging Facility
The multi-user Laboratory for Multiscale Imaging (LMSI) provides state-of-the-art instrumentation and expertise in morphological characterization to support and elevate research, and it helps leverage Stevens' capabilities to attract further support for new and significant self-sustaining programs.